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SiO2-P2O5-HfO2-Al2O3-Na2O glasses activated by Er3+ ions: From bulk sample to planar waveguide fabricated by rf-sputtering

Articolo
Data di Pubblicazione:
2017
Abstract:
0.4 Er3+-doped 90.7 SiO2 - 4.4 P2O5 - 2.3 HfO2 - 1.7 Al2O3 - 0.7 Na2O planar waveguide was fabricated by multi-target rf-sputtering technique starting by massive Er3+-activated P2O5-SiO2-Al2O3-Na2O glass. The optical parameters were measured by m-line apparatus operating at 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by Energy Dispersive X-ray Spectroscopy and its morphology analyzed by Atomic Force Microscopy. The waveguide exhibits a single propagation mode at 1319 and 1542 nm with an attenuation coefficient of 0.2 dB/cm in the infrared. The emission of 4I13/2 -> 4I15/2 transition of Er3+ ion, with a 28.5 nm bandwidth was observed upon TE0 mode excitation at 514.5 nm. The optical and spectroscopic features of the Er3+-activated parent P2O5-SiO2-Al2O3-Na2O glass were also investigated.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Erbium; Hafnia; Luminescence; Optical properties; Phosphate; Planar waveguides; Rf-sputtering; Silica
Elenco autori:
Righini, Giancarlo; Lukowiak, ANNA LUIZA; Vasilchenko, Iustyna; Valligatla, Sreeramulu; Zur, LIDIA ZUZANNA; Ferrari, Maurizio; Chiasera, Alessandro; Varas, Stefano
Autori di Ateneo:
CHIASERA ALESSANDRO
RIGHINI GIANCARLO
VARAS STEFANO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/354258
Pubblicato in:
OPTICAL MATERIALS
Journal
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URL

http://dx.doi.org/10.1016/j.optmat.2016.06.025
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