Electron spectroscopic imaging of dopant precipitation and segregation in silicon

Conventional, high-resolution electron microscopy and electron spectroscopy imaging methods have been applied to the characterization of furnace-annealed B-implanted Si and self-annealed As-implanted Si. The combination of these techniques allowed us to point out the presence of a coherent precipitation in the SiBx system and the segregation of As at the (111) surfaces of octahedral cavities produced during self-annealing implantation of Si. A simple ideal structural model of the voids with segregated As is proposed.