Comment on "Etch characteristics of CeO2 thin film in Ar/CF4/Cl2 plasma" [J. Vac. Sci. Technol. A 21, 426 (2003)]

Academic Article
Publication Date:
2004
Iris type:
01.08 Comunicazione in rivista (Letter - Letter to editor)
Keywords:
XPS; Ce3d spectra
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/406935
Published in:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS
Journal