Deposition of thin films containing carboxylic acid groups on polyurethane foams by atmospheric pressure non-equilibrium plasma jet
Academic Article
Publication Date:
2019
abstract:
Thin films containing carboxylic acid groups are deposited on open-cell polyurethane (PU) foams by using an atmospheric pressure non-equilibrium plasma jet, in dielectric barrier discharge configuration, fed with helium, acrylic acid and ethylene.
Iris type:
01.01 Articolo in rivista
Keywords:
Atmospheric pressure plasma jet; Thin film deposition; Acrylic acid; Open-cell foam; 3D porous material
List of contributors:
Fracassi, Francesco; Milella, Antonella; Fanelli, Fiorenza
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