Deposition of thin films containing carboxylic acid groups on polyurethane foams by atmospheric pressure non-equilibrium plasma jet
Articolo
Data di Pubblicazione:
2019
Abstract:
Thin films containing carboxylic acid groups are deposited on open-cell polyurethane (PU) foams by using an atmospheric pressure non-equilibrium plasma jet, in dielectric barrier discharge configuration, fed with helium, acrylic acid and ethylene.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Atmospheric pressure plasma jet; Thin film deposition; Acrylic acid; Open-cell foam; 3D porous material
Elenco autori:
Fracassi, Francesco; Milella, Antonella; Fanelli, Fiorenza
Link alla scheda completa:
Pubblicato in: