Data di Pubblicazione:
1982
Abstract:
Self-annealing implantation with dopant ions has been successfully applied to the fabrication of silicon solar cells. Experimental conditions as well as solar cell parameters are presented and discussed.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Gabilli, Edgardo; Lotti, Riccardo; Merli, PIER GIORGIO; Nipoti, Roberta; Ostoja, Paolo
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