EFFECT OF MODULATION ON THE PLASMA DEPOSITION OF HYDROGENATED AND FLUORINATED SILICON-NITRIDE

Conference Paper
Publication Date:
1990
abstract:
Hydrogenated and fluorinated silicon nitride films are obtained in a novel resonant plasma-chemical reactor, operated at l8MHz and modulated in the audiofrequency field. This modulation influences both deposition rate and film properties.
Iris type:
04.01 Contributo in Atti di convegno
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/121208
Book title:
PLASMA-SURFACE INTERACTIONS AND PROCESSING OF MATERIALS
Published in:
NATO ASI SERIES. SERIES E, APPLIED SCIENCE
Journal