EFFECT OF MODULATION ON THE PLASMA DEPOSITION OF HYDROGENATED AND FLUORINATED SILICON-NITRIDE

Contributo in Atti di convegno
Data di Pubblicazione:
1990
Abstract:
Hydrogenated and fluorinated silicon nitride films are obtained in a novel resonant plasma-chemical reactor, operated at l8MHz and modulated in the audiofrequency field. This modulation influences both deposition rate and film properties.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Elenco autori:
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/121208
Titolo del libro:
PLASMA-SURFACE INTERACTIONS AND PROCESSING OF MATERIALS
Pubblicato in:
NATO ASI SERIES. SERIES E, APPLIED SCIENCE
Journal