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Structure of the oxide damage under progressive breakdown

Academic Article
Publication Date:
2005
abstract:
The I-V characteristics of ultra-thin gate oxides under progressive breakdown (BD) show a common behavior, indicative of well-defined general physical features of the BD spot. Transmission electron microscopy (TEM) observations give some hints about this structure and on this basis we propose a physical model of the post-BD current, which is in good agreement with data.
Iris type:
01.01 Articolo in rivista
List of contributors:
Lombardo, SALVATORE ANTONINO
Authors of the University:
LOMBARDO SALVATORE ANTONINO
Handle:
https://iris.cnr.it/handle/20.500.14243/41641
Published in:
MICROELECTRONICS AND RELIABILITY
Journal
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