Publication Date:
1998
abstract:
Dielectric-like degradation of thin-film conductors is simulated up to final breakdown within a biased percolation model. As relevant indicators we take the damage pattern, current distribution, resistance variation, failure lifetime and relative resistance fluctuations. The results show that biased percolation predicts well several known features taking place close to the abrupt failure of thin films in close agreement with available experimental results.
Iris type:
01.01 Articolo in rivista
List of contributors:
DE VITTORIO, Massimo; Cola, Adriano; Mazzer, Massimo
Published in: