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A percolative simulation of dielectric-like breakdown

Academic Article
Publication Date:
1998
abstract:
Dielectric-like degradation of thin-film conductors is simulated up to final breakdown within a biased percolation model. As relevant indicators we take the damage pattern, current distribution, resistance variation, failure lifetime and relative resistance fluctuations. The results show that biased percolation predicts well several known features taking place close to the abrupt failure of thin films in close agreement with available experimental results.
Iris type:
01.01 Articolo in rivista
List of contributors:
DE VITTORIO, Massimo; Cola, Adriano; Mazzer, Massimo
Authors of the University:
COLA ADRIANO
MAZZER MASSIMO
Handle:
https://iris.cnr.it/handle/20.500.14243/205029
Published in:
MICROELECTRONICS AND RELIABILITY
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S0026271497000462
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