Data di Pubblicazione:
2016
Abstract:
Nanoscale dielectric films made of alumina grown by atomic
layer deposition (ALD) have been implemented as high-k
dielectric material in organic light emitting transistors
(OLETs). This leads to the reduction of both the threshold
and operating bias regime of the devices while obtaining
comparable light emission, when compared to our standard
polymer-based dielectric platform.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
OLET
Elenco autori:
Generali, Gianluca; Soldano, Caterina; Fanciulli, Marco; Muccini, Michele; Cianci, Elena
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