Magnetic hysteresis in array of magnetic nanostructures by block copolymers

Synthesis of nanopatterned magnetic materials offers advanced capabilities in tailoring material structures and opens up new opportunities for engineering innovative devices (i.e. electronic and biomedical). In the frame of magnetic materials, the most demanding application consists in fabricating high-density arrays for use in data storage and magnetic sensors for spintronics [1]. In the last decade, many routes for the reliable fabrication of magnetic nanostructures have been extensively investigated, including top-down lithography and bottom-up self-assembly processes. Conventional electron beam lithography (EBL) soon turned out to be limited by low-speed and high costs while self-assembling emerged as a viable and handy alternative technique for designing nanostructures over a wide area on magnetic thin films.