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MOCVD of Al2O3 films using new dialkylaluminum acetylacetonate precursors: growth kinetics and process yields

Academic Article
Publication Date:
2001
Iris type:
01.01 Articolo in rivista
List of contributors:
Carta, Giovanni; Battiston, Giovanni; Gerbasi, Rosalba; Porchia, Marina; Rossetto, GILBERTO LUCIO
Handle:
https://iris.cnr.it/handle/20.500.14243/163734
Published in:
CHEMICAL VAPOR DEPOSITION
Journal
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