Data di Pubblicazione:
2008
Abstract:
We investigated the process of ultrafast laser ablation of metallic targets induced by a pair of identical laser pulses, with either p or s polarizations, temporally delayed from approximate to 1 ps to a few nanoseconds. We used fast ion probe diagnostics to characterize the ion plume at the moderate laser intensity (approximate to 10(12) W/cm(2)) typically employed in ultrafast laser deposition and material processing. We observed a consistent time-correlated enhancement of the ion yield and velocity, which lends itself to an interesting and useful method for manipulating ablation plasma characteristics. The mechanisms producing this feature are also discussed.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
VACUUM; GENERATION; EFFICIENCY; SILICON; NICKEL
Elenco autori:
Amoruso, Salvatore; Bruzzese, Riccardo; Xia, Jinan; Wang, Xuan
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