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Metal-Organic Chemical Vapor Deposition of BiFeO3 based multiferroics

Contributo in Atti di convegno
Data di Pubblicazione:
2014
Abstract:
BiFeO3 films undoped and doped with Ba and/or Ti have been fabricated through Metal- Organic Chemical Vapor Deposition (MOCVD) on SrTiO3 (100), SrTiO3:Nb (100) and YSZ (100) substrates. Films have been deposited using a multi-metal source, consisting of the Bi(phenyl)3, Fe(tmhd)3, Ba(hfa)2otetraglyme and Ti(tmhd)2(O-iPr)2 (phenyl= -C6H5, H-tmhd=2,2,6,6- tetramethyl-3,5-heptandione; O-iPr= iso-propoxide; H-hfa=1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme = CH3O(CH2CH2O)4CH3) precursor mixture. The structural and morphological characterization of films has been carried out using X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). Chemical compositional studies have been performed by energy dispersive X-ray (EDX) analysis. Structural and morphological characterizations point to the formation of crystalline phases and homogeneous surfaces for both undoped and doped BiFeO3 films. Piezoresponse force microscopy (PFM) and piezoresponce force spectroscopy (PFS) have been applied to study the piezoelectric and ferroelectric properties of the films.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Keywords:
BiFeO3; multiferroic thin films; MOCVD; pole figures; PFM
Elenco autori:
LO NIGRO, Raffaella
Autori di Ateneo:
LO NIGRO RAFFAELLA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/275818
Titolo del libro:
Advances in Science and Technology
Pubblicato in:
ADVANCES IN SCIENCE AND TECHNOLOGY (CD-ROM)
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