Plasma ehnancement of metalorganic chemical vapor deposition and properties of Er2O3 nanostructured thin films
Articolo
Data di Pubblicazione:
2007
Abstract:
An O2 remote plasma metal organic chemical vapor deposition RP-MOCVD route is presented for
tailoring the structural, morphological, and optical properties of Er2O3 thin films grown on Si100
using the trisisopropylcyclopentadienylerbium precursor. The RP-MOCVD approach produced
highly (100)-oriented, dense, and mechanically stable Er2O3 films with columnar structure.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Tondello, Eugenio; Capezzuto, Pio; Giangregorio, MARIA MICHELA; Losurdo, Maria; Armelao, Lidia; Bruno, Giovanni; Barreca, Davide; Sacchetti, Alberto; LO NIGRO, Raffaella
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