Data di Pubblicazione:
2008
Abstract:
This review deals with the recent advancement of chemical synthesis in diverse areas (organic and organometallic chemistry, polymers and materials science) based on the role of silyl radicals. Selected examples using organosilanes, and in particular tris(trimethylsilyl)silane, as radical-based reducing agents show the flexibility and applicability of these compounds in several synthetic transformations: radical reductions, consecutive radical reactions and hydrosilylations. The radical-based functionalization of flat hydrogen-terminated silicon surfaces is also covered. The scope, limitations and mechanism of these reactions is sufficiently well understood that they can be used predictably and reliably in the surfaces modification. © 2008 Elsevier Inc. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
SELF-DIRECTED GROWTH; HYDROGEN-TERMINATED SILICON; POLARITY-REVERSAL CATALYSIS; COVALENTLY ATTACHED MONOLAYERS; EXTREMELY MILD ATTACHMENT; CARBON-CENTERED RADICALS; GROUP 14 HYDRIDES; REDUCING AGENT; RATE CONSTANTS; ORGANIC MONOLAYERS
Elenco autori:
Chatgilialoglu, Chryssostomos
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