XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers

Articolo
Data di Pubblicazione:
2012
Abstract:
X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
XPS; chemical composition; ultra thin layers; crested barriers; Si nitride; cap layer
Elenco autori:
Autori di Ateneo:
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/120229
Pubblicato in:
SURFACE AND INTERFACE ANALYSIS (ONLINE)
Journal