Skip to Main Content (Press Enter)

Logo CNR
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze

UNI-FIND
Logo CNR

|

UNI-FIND

cnr.it
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze
  1. Pubblicazioni

Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL

Articolo
Data di Pubblicazione:
2016
Abstract:
This paper is focused on the understanding of the effect of the nanoimprint lithography process on the elastic modulus of thin, thermoplastic films. In particular, we present the comparison between the standard and an ultrafast thermal NIL technology as well as the way both processes affect the top surface of poly(methyl methacrylate) (PMMA). The PeakForce QNM (TM) (Quantitative Nanomechanical Property Mapping) scanning probe technique was used to determine the Young's modulus of PMMA by comparison with a polystyrene standard. We demonstrate that imprinted PMMA, regardless of the used method, shows a 9-fold increase of Young's modulus compared to non-imprinted PMMA at least in the top 3-5 nm thick surface layer. This important finding proves that the ultrafast process with much higher temperatures, but also with much shorter process times, leads to elastic surface properties that are comparable to those of PMMA imprinted with the standard process. We have confirmed that annealing alone does not significantly influence the Young's modulus. (C) 2016 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Thermal NIL; Pulsed-NIL; PMMA; PeakForce AFM; Young's modulus
Elenco autori:
Pozzato, Alessandro; Sovernigo, Enrico; Pianigiani, Michele; Tormen, Massimo
Autori di Ateneo:
TORMEN MASSIMO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/384885
Pubblicato in:
MICROELECTRONIC ENGINEERING
Journal
  • Utilizzo dei cookie

Realizzato con VIVO | Designed by Cineca | 26.5.0.0 | Sorgente dati: PREPROD (Ribaltamento disabilitato)