Strong Raman yield enhancement in large Si nanocrystals from ultraviolet to infrared: Density and shape dependence
Articolo
Data di Pubblicazione:
2019
Abstract:
[object Object]Silicon nanocrystals, few hundred nanometers in size, demonstrate impressive Raman yield enhancement. We report, first, the enormous Raman yield enhancement obtained with octahedral-shaped nanocrystals in a wide wave- length range going from the ultraviolet, through the visible, to the infrared. We observed, along with the main Si peak amplification at 521 cm-1, also the amplification of the 480 cm-1 broad peak of a thin amorphous Si layer embedded between the nanocrystals, together with an amplification of the overall background under both Raman peaks. In order to clarify the mecha- nism governing the previous enhancements, the previous data were completed exploring the influence of shape by using irregular nanocrystals of similar size. These latter nanocrystals showed an amplified Raman yield, although reduced with respect to those of octahedral shape. Collected data, displayed as a func- tion of the size and density, have been interpreted and discussed.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
chemical vapor deposition; Raman amplification; silicon nanoparticle
Elenco autori:
Mannino, Giovanni; Italia, Markus
Link alla scheda completa:
Pubblicato in: