Quantitative explanation of gas pressure differences due to etching of a-Si:H layers in NF3 plasma

Conference Paper
Publication Date:
1994
Iris type:
04.01 Contributo in Atti di convegno
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/116740
Book title:
XIIth Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG-XII)