Skip to Main Content (Press Enter)
×
Home
People
Outputs
Organizations
Expertise & Skills
IT
EN
☰
UNI-FIND
|
UNI-FIND
cnr.it
IT
EN
×
Home
People
Outputs
Organizations
Expertise & Skills
☰
Outputs
A Study of the Growth Mechanism of Microcristalline Thin Silicon Films Deposited at Low Temperature by SiF4-H2 PECVD
Academic Article
Publication Date:
2004
Iris type:
01.01 Articolo in rivista
List of contributors:
Capezzuto, Pio; Giangregorio, MARIA MICHELA; Losurdo, Maria; Bruno, Giovanni
Authors of the University:
GIANGREGORIO MARIA MICHELA
Handle:
https://iris.cnr.it/handle/20.500.14243/33526
