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Stability of Cr/C multilayer during synchrotron radiation exposure and thermal annealing

Articolo
Data di Pubblicazione:
2019
Abstract:
The stability of Cr/C multilayer during irradiation or thermal annealing was investigated using grazing incidence X-ray reflectivity measurement, X-ray photoelectron spectroscopy, X-ray diffraction analysis, small-angle X-ray scattering analysis, and soft X-ray reflectivity measurement. One sample was irradiated with a white beam of synchrotron radiation and five other samples were annealed at various temperatures. The 18-h irradiation treatment caused local surface contaminants but did not affect the buried stacks. The annealing treatment resulted in increased reflectivity at approximately 1.2 keV, and the multilayer remained stable for temperature up to 700 degrees C. Thus, the Cr/C multilayers exhibited excellent stability during irradiation and thermal treatments and can be used for the mirrors and multilayer gratings of third-generation synchrotron radiation systems. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
EUV multilayers; synchrotron radiation
Elenco autori:
Giglia, Angelo
Autori di Ateneo:
GIGLIA ANGELO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/380512
Pubblicato in:
OPTICS EXPRESS
Journal
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