Giant random telegraph signal generated by single charge trapping in submicron n-metal-oxide-semiconductor field-effect transistors
Articolo
Data di Pubblicazione:
2008
Abstract:
We report on the current fluctuations of random telegraph signal experimentally observed at cryogenic temperatures in ordinary submicron Si/SiO2 metal-oxide-semiconductor field-effect transistors (MOSFETs). A giant drain current fluctuation Delta I/I up to 55% is observed at sub-Kelvin temperature in samples with a large channel width. The current variation is compatible with predictions for decanano MOSFETs at room temperature. The similarity suggests the formation of a quasi-one-dimensional conduction channel at gate voltages sufficiently close to the threshold voltage. (C) 2008 American Institute of Physics.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
SILICON INVERSION-LAYERS; MICROWAVE IRRADIATION; SPIN-RESONANCE; ELECTRON-SPIN; QUANTUM-DOT
Elenco autori:
Fanciulli, Marco; Prati, Enrico
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