Data di Pubblicazione:
2012
Abstract:
Further insight into the dissociative adsorption of NH 3 on Si(001) has been obtained using a combined computational and experimental approach. A novel route leading to the dissociation of the chemisorbed NH 3 is proposed, based on H-bonding interactions between the gas phase and the chemisorbed NH 3 molecules. Our model, complemented by synchrotron radiation photoelectron spectroscopy measurements, demonstrates that the low temperature dissociation of molecular chemisorbed NH 3 is driven by the continuous flux of ammonia molecules from the gas phase
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
SI(100) SURFACE; AB-INITIO; ADSORPTION; 1ST-PRINCIPLES; DECOMPOSITION
Elenco autori:
Baraldi, Alessandro; Satta, Mauro; Larciprete, Rosanna; Flammini, Roberto
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