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Fundamental Role of the H-Bond Interaction in the Dissociation of NH3 on Si(001)-(2x1)

Academic Article
Publication Date:
2012
abstract:
Further insight into the dissociative adsorption of NH 3 on Si(001) has been obtained using a combined computational and experimental approach. A novel route leading to the dissociation of the chemisorbed NH 3 is proposed, based on H-bonding interactions between the gas phase and the chemisorbed NH 3 molecules. Our model, complemented by synchrotron radiation photoelectron spectroscopy measurements, demonstrates that the low temperature dissociation of molecular chemisorbed NH 3 is driven by the continuous flux of ammonia molecules from the gas phase
Iris type:
01.01 Articolo in rivista
Keywords:
SI(100) SURFACE; AB-INITIO; ADSORPTION; 1ST-PRINCIPLES; DECOMPOSITION
List of contributors:
Baraldi, Alessandro; Satta, Mauro; Larciprete, Rosanna; Flammini, Roberto
Authors of the University:
FLAMMINI ROBERTO
LARCIPRETE ROSANNA
SATTA MAURO
Handle:
https://iris.cnr.it/handle/20.500.14243/235433
Published in:
PHYSICAL REVIEW LETTERS (PRINT)
Journal
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URL

http://prl.aps.org/abstract/PRL/v109/i3/e036102
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