Study of NF3 Plasmas for the Ablation of Amorphous Silicon from internal PECVD Reactor walls

Abstract
Publication Date:
1993
Iris type:
04.02 Abstract in Atti di convegno
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/142422
Book title:
Abstracts XII Congresso Nazionale sulla Scienza e Tecnologia del Vuoto