Relashionship between precursor nature and NiO film properties

In this work, we report the fabrication of NiO films from two different nickel b-doketonate complexes as precursors for MOCVD. Volatile and thermally stable Ni complexes were prepared by the reaction of nickel acetate suspended in dicloromethane with b-diketonates (Hhfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedione and Htta=2-thenoyl-trifluoroacetone) and N-donor ligand tmeda (tmeda=N',N',N,N,-tetramethyl-ethylendiamine) to obtain respectively the complexes Ni(hfa)2tmeda and Ni(tta)2tmeda. These cpmplexes were applied as precursors in MCVD experiments directed to NiO deposition. The films grown on quartz were characterized using X-ray diffraction analysis (XRD), field emission scannng electron microscopy (FE-SEM) and atomic force microscopy (AFM). The optical proerties were determined by UV and ellipsometric measurements.