Publication Date:
2012
abstract:
Aim of this paper is to investigate on a statistical basis at the wafer level the relationship
existing among the dark currents of the single pixel compared to the whole Silicon Photomultiplier
array. This is the first time to our knowledge that such a comparison is made, crucial to pass this new
technology to the semiconductor manufacturing standards. In particular, emission microscopy
measurements and current measurements allowed us to conclude that optical trenches strongly improve
the device performances.
Iris type:
01.01 Articolo in rivista
Keywords:
silicon photomultipliers; dark current; wafer level
List of contributors:
Pagano, Roberto; Lombardo, SALVATORE ANTONINO; Libertino, Sebania
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