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Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures

Academic Article
Publication Date:
2011
abstract:
We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This deposition system creates a "blistered" graphene surface due to strain induced by the transfer process itself. Single-layer-graphene deposition and its blistering on the substrate are demonstrated by a combination of Raman spectroscopy, scanning electron microscopy, and atomic-force microscopy measurements. Finally, we demonstrate that blister-like suspended graphene are self-supporting single-layer structures and can be flattened by employing a spatially resolved direct-lithography technique based on electron-beam induced etching.
Iris type:
01.01 Articolo in rivista
Keywords:
graphene; blister; AFM; Raman; SEM
List of contributors:
Piazza, Vincenzo; Beltram, Fabio; Pingue, Pasqualantonio; Goler, Sarah; Roddaro, Stefano; Pellegrini, Vittorio
Handle:
https://iris.cnr.it/handle/20.500.14243/234563
Published in:
JOURNAL OF APPLIED PHYSICS
Journal
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URL

http://jap.aip.org/resource/1/japiau/v110/i6/p064308_s1
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