Data di Pubblicazione:
2011
Abstract:
Hydrogen plasma pretreatment is used to enforce the growth of vertically-aligned carbon nanotube forests on TiN substrates. The evolution of the substrate, catalyst, and nanotubes are studied by in situ and ex-situ photoemission and X-ray diffraction in order to understand the growth mechanism. We find that TiN retains its crystallographic structure and its conductivity during plasma pretreatment and nanotube growth, which is confirmed by electrical measurements. Plasma pretreatment is found to favor the growth of nanotube forests by root growth, as it binds the catalyst nanoparticles more strongly to the substrate than thermal pretreatment. We find that plasma pretreatment time should be limited, otherwise poor or no growth is found. VC
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
carbon nanotubes; chemical vapour deposition; TiN; interconnect
Elenco autori:
CASTELLARIN CUDIA, Carla; Bhardwaj, SUNIL PARASNATH; Cepek, Cinzia
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