Pulsed laser ablation of NbN/MgO/NbN multilayers

NbNrMgOrNbN multilayers have been grown by pulsed laser ablation in pure N2 and O2 atmospheres. A Nd:YAG laser, operating at ls532 nm, pulse width 10 ns, and energy density in the range 1-2.5 Jrcm2, was used. The laser beam was focused at an angle of 458 on Nb and Mg metallic targets. A rotating multiple-target holder system allowed in-situ depositions of the multilayers. The samples were grown on SrTiO3 100. substrates 5 cm from the target and held at 5508C NbN. and 2508C MgO.. The morphology and structure of the deposited multilayers were verified by XRD, EDS, as well as electrical measurements.