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PLD deposition of Tungsten Carbide contact for diamond photodiodes. Influence of process conditions on electronic and chemical aspects

Academic Article
Publication Date:
2013
abstract:
Tungsten carbide, WC, contacts behave as very reliable Schottky contacts for opto-electronic diamond devices. Diamond is characterized by superior properties in high-power, high frequency and hightemperature applications, provided that thermally stable electrode contacts will be realized. Ohmic contacts can be easily achieved by using carbide-forming metals, while is difficult to get stable Schottky contacts at elevated temperatures, due to the interface reaction and/or inter-diffusion between metals and diamond. Novel type of contacts, made of tungsten carbide, WC, seem to be the best solution, for their excellent thermal stability, high melting point, oxidation and radiation resistance and good electrical conductivity. Our research was aimed at using pulsed laser deposition forWCthin film deposition, optimizing experimental parameters, to obtain a final device characterized by excellent electronic properties, as a detector for radiation in deep UV or as X-ray dosimeter. We deposited our films by laser ablation from a target of pure WC, using different reaction conditions (i.e., substrate heating, vacuum or reactive atmosphere (CH4/Ar), RF plasma activated), to optimize both the stoichiometry of the film and its structure. Trying to obtain a material with the best electronic response, we used also two sources of laser radiation for target ablation, i.e., nano-second pulsed excimer laser ArF, and ultra-short fs Ti:Sapphire laser. The structure and chemical aspects have been evaluated by Raman and X-ray photoelectron spectroscopy (XPS), while the dosimeter photodiode response has been tested by the I-V measurements, under soft X-ray irradiation.
Iris type:
01.01 Articolo in rivista
Keywords:
WC films; Pulsed laser deposition; XPS and Raman characterization; I-V dosimetric response; Schottky contacts on diamond
List of contributors:
Bellucci, Alessandro; Cappelli, Emilia; Orlando, Stefano; Trucchi, DANIELE MARIA; Valentini, Veronica; Mezzi, Alessio
Authors of the University:
BELLUCCI ALESSANDRO
MEZZI ALESSIO
ORLANDO STEFANO
TRUCCHI DANIELE MARIA
VALENTINI VERONICA
Handle:
https://iris.cnr.it/handle/20.500.14243/15580
Published in:
APPLIED SURFACE SCIENCE
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S0169433213003097
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