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TiO2 coating by atmospheric pressure MOCVD in a conveyor belt furnace for industrial applications

Articolo
Data di Pubblicazione:
1999
Abstract:
An inexpensive, high-volume CVD production system for a protective oxide coating is described. The critical point with such a process is the precursor mixer and injector head? and an original and simple structure has been designed (see Figure). Uniform, adherent, good quality TiO2 anatase films have been obtained and their functionality at high temperatures has been tested
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
CHEMICAL-VAPOR-DEPOSITION; TITANIUM TETRAISOPROPOXIDE; FILMS
Elenco autori:
Gerbasi, Rosalba; Porchia, Marina
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/131784
Pubblicato in:
CHEMICAL VAPOR DEPOSITION
Journal
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Dati Generali

URL

http://onlinelibrary.wiley.com/doi/10.1002/(SICI)1521-3862(199903)5:2%3C73::AID-CVDE73%3E3.0.CO;2-L/pdf
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