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Time evolution of plasma afterglow produced by femtosecond laser pulses

Academic Article
Publication Date:
2004
abstract:
In this paper we investigate the time evolution of laser plasmas generated in atmospheric air by ultrashort (100 fs) laser pulses. The detected quantity is the time integrated photon yield emitted by the plasma, which monotonically depends on the amount of energy transferred by the laser pulses to the plasma. We study the effect of a preionizing pulse on the efficiency of plasma generation by a second "probe" pulse and demonstrate that preionization results into a considerable increase of the overall photon yield emitted by the plasma. An explanation of this phenomenon relies on the fact that the larger the electron density experienced by the probe pulse, the more effective the energy transfer from the probe pulse to the residual plasma, the more intense is the light from the plasma. With this concept in mind and by relying on a pump-probe technique, we also measure the total photon yield emitted by the plasma produced by the combination of the two pulses, as a function of their relative delay time. We observe a considerable increase in the plasma brightness for delay times much longer than the laser pulse duration. This phenomenon is associated with an increase of the electron density even after the end of the pump pulse, due to secondary electron-impact ionization originating from highly-energetic primary photoelectrons, and to superelastic electron-molecule collisions. We also develop a simplified model describing the time evolution of the electron and ion densities and the electron temperature. From the calculated time evolution of these quantities produced by a single laser pulse, we can predict with a good approximation the main features of the plasma generated by an ultrashort laser pulse.
Iris type:
01.01 Articolo in rivista
List of contributors:
DE LISIO, Corrado; Porzio, Alberto
Authors of the University:
PORZIO ALBERTO
Handle:
https://iris.cnr.it/handle/20.500.14243/14761
Published in:
JOURNAL OF APPLIED PHYSICS
Journal
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URL

http://jap.aip.org/resource/1/japiau/v96/i10/p5450_s1
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