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Annealing effects on faceting of InAs/GaAs(001) quantum dots

Articolo
Data di Pubblicazione:
2009
Abstract:
The aspect ratio and faceting evolution of quantum dots grown at 500 degrees C were studied as a function of postgrowth annealing temperature. We show that faceting and aspect ratio strictly depend on growth conditions. The evolution toward {136} and {137} facets is kinetically limited and occurs under different experimental conditions. Furthermore long annealing procedures lead to the occurrence of low aspect ratio domes different from those forming at higher growth temperatures.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
annealing; gallium arsenide; III-V semiconductors; semiconductor growth; semiconductor quantum dots
Elenco autori:
Placidi, Ernesto
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/13664
Pubblicato in:
APPLIED PHYSICS LETTERS (ONLINE)
Journal
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URL

http://apl.aip.org/resource/1/applab/v94/i2/p021901_s1
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