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Elemental distribution in fluorinated amorphous carbon thin films

Articolo
Data di Pubblicazione:
2005
Abstract:
Focused ion beam-secondary ion mass spectrometry (FIB-SIMS) with 20 nm spatial resolution has been used to analyze amorphous fluorinated carbon thin films, deposited by plasma assisted chemical vapor deposition (PACVD), at micro- to nano-scale. Mass spectra and ion imaging of film surface were acquired and the presence and distribution of contaminants were investigated. Surface images show the secondary ion distribution for F-, CH-, CF-. A change in size and topology of fluorine-rich areas is correlated with film hardness and with microstructure transition from diamond-like to polymer-like, as indicated by infrared and Raman spectroscopies. Based on the surface distributions of CF- and CH- and on the vibrational spectroscopy results, a mechanism of fluorine substitution for hydrogen and an attempt to explain the film structure and microstructure is proposed.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
LOW-DIELECTRIC-CONSTANT; C-H FILMS; MECHANICAL-PROPERTIES; PLASMA DECOMPOSITION; PACVD
Elenco autori:
Lamperti, Alessio
Autori di Ateneo:
LAMPERTI ALESSIO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/1331
Pubblicato in:
JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY
Journal
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