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High-quality electron bunch production for high-brilliance Thomson Scattering sources

Conference Paper
Publication Date:
2017
abstract:
Laser Wake Field accelerated electrons need to exhibit a good beam-quality to comply with requirements of FEL or high brilliance Thomson Scattering sources, or to be post-accelerated in a further LWFA stage towards TeV energy scale. Controlling electron injection, plasma density profile and laser pulse evolution are therefore crucial tasks for high-quality e-bunch production. A new bunch injection scheme, the Resonant Multi-Pulse Ionization Injection (RMPII), is based on a single, ultrashort Ti:Sa laser system. In the RMPII the main portion of the pulse is temporally shaped as a sequence of resonant sub-pulses, while a minor portion acts as an ionizing pulse. Simulations show that high-quality electron bunches with energies in the range 265MeV -1.15GeV, normalized emittance as low as 0.08 mm·mrad and 0.65% energy spread can be obtained with a single 250 TW Ti:Sa laser system. Applications of the e-beam in high-brilliance Thomson Scattering source, including 1.5 - 26.4 MeV ? sources with peak brilliance up to 1 · 10ph/(s · mm o mrad o 0.1%bw), are reported.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
laser wakefield acceleration
List of contributors:
Terzani, Davide; Gizzi, LEONIDA ANTONIO; Labate, LUCA UMBERTO; Tomassini, Paolo
Authors of the University:
GIZZI LEONIDA ANTONIO
LABATE LUCA UMBERTO
Handle:
https://iris.cnr.it/handle/20.500.14243/401937
Published in:
PROCEEDINGS OF SPIE, THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING
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http://www.scopus.com/record/display.url?eid=2-s2.0-85029184382&origin=inward
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