Analysis and characterization of the system Si nanocluster/SiOx

This book reviews the subject of Si quantum dots embedded in dielectric andits application to the realization of non volatile semiconductor memories and optoelectronicdevices, this dialing various approaches for the analysis of the materialsthrough transmission electron microscopy (TEM). The advantages coming froman innovative application of energy filtered TEM (EFETM) are put in clear evidence. Themanuscript then focuses on the synthesis of the materials: three different methodologiesfor the realization of the dots based on chemical vapor deposition (CVD)and ion implantation are described in detail, and physical models providing someunderstanding of the observed phenomenology are reported as well.