Influence of the dislocation loops on the anomalous diffusion of Fe implanted into InP
Contributo in Atti di convegno
Data di Pubblicazione:
1997
Abstract:
The influence of crystal defects formed upon annealing in determining the anomalous distribution of Fe implanted into InP has been studied by comparing samples submitted to single Fe implant and double Fe + P implant in the MeV energy range. It is shown that end of range dislocation loops, as well as interfaces of bands of defects, are preferential sites for gettering and accumulation of Fe.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Keywords:
Diffusion; Dislocation Loops; Fe Anomalous; Fe Implantation; InP
Elenco autori:
Frigeri, Cesare; Rossetto, GILBERTO LUCIO; Camporese, Andrea
Link alla scheda completa:
Titolo del libro:
DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3
Pubblicato in: