Forward current of Al+ implanted 4H-SiC diodes: A study on the periphery and area components
Conference Paper
Publication Date:
2016
abstract:
The temperature dependence of the bulk and periphery forward current components of vertical 4H-SiC p-i-n diodes, with Al implanted circular anodes of diameters in the range 150-1000 ?m, have been obtained from the analysis of the results of forward current-voltage measurements in the temperature range 30-290°C. The zero voltage bulk and periphery current densities at different temperatures have been used to compute the temperature dependence of: (i) the effective carrier lifetime in the space charge region, (ii) the minority carrier diffusion coefficient to lifetime ratio in the base region, and (iii) a surface quality parameter.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
4H-SiC; Defect; Diode; Ion implantation; Lifetime; P-i-n
List of contributors:
Puzzanghera, Maurizio; Nipoti, Roberta
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