Data di Pubblicazione:
2006
Abstract:
We report on the simultaneous fabrication by interference litography of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The moirè effect is used in the litographic process to fabricate complex structures which coul find application in photonic bandgap devices
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
interference; litography; lithium niobate; optoelectronics; nanotechnology
Elenco autori:
DE NICOLA, Sergio; Pierattini, Giovanni
Link alla scheda completa:
Pubblicato in: