Metal Organic Chemical Vapor Deposition of Bi2O3 thin films from triphenyl bismuth

An easy and reproducible procedure to grow pure and mixed phase Bi2O3 films from triphenyl bismuth on SiO2/Si(100) and Al2O3 by MOCVD is presented. The elemental composition of the films is determined by XPS, the surface morphology by AFM and the phase composition by XRD. For the samples deposited on SiO2/Si(100) FT-IR spectroscopy is demonstrated useful for a preliminary examination of the phases.