Effect of the microstructure of the semiconductor support on the photocatalytic performance of the pt-ptox/tio2 catalyst system

The influence of the semiconductor microstructure on the photocatalytic behavior of Pt-PtOx/TiO2 catalysts was studied by comparing the methanol-reforming performance of systems based on commercial P25 or TiO2 from sol-gel synthesis calcined at different temperatures. The Pt co-catalyst was deposited by incipient wetness and formed either by calcination or high-temperature H2 treatment. Structural features of the photocatalysts were established by X-ray powder diffraction (XRD), electron spin resonance (ESR), X-ray photoelectron spectroscopy (XPS), optical absorption, Raman spectroscopy and TEM measurements. In situ reduction of Pt during the photocatalytic reaction was generally observed. The P25-based samples showed the best H2 production, while the activity of all sol-gel-based samples was similar in spite of the varying microstructures resulting from the different preparation conditions. Accordingly, the sol-gel-based TiO2 has a fundamental structural feature interfering with its photocatalytic performance, which could not be improved by annealing in the 400-500oC range even by scarifying specific surface area at higher temperatures.