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Deterministic patterned growth of high-mobility large-crystal graphene: A path towards wafer scale integration

Academic Article
Publication Date:
2017
abstract:
We demonstrate rapid deterministic (seeded) growth of large single-crystals of graphene by chemical vapour deposition (CVD) utilising pre-patterned copper substrates with chromium nucleation sites. Arrays of graphene single-crystals as large as several hundred microns are grown with a periodicity of up to 1 mm. The graphene is transferred to target substrates using aligned and contamination-free semi-dry transfer. The high quality of the synthesised graphene is confirmed by Raman spectroscopy and transport measurements, demonstrating room-temperature carrier mobility of 21 000 cm2 V-1 s-1 when transferred on top of hexagonal boron nitride. By tailoring the nucleation of large single-crystals according to the desired device geometry, it will be possible to produce complex device architectures based on single-crystal graphene, thus paving the way to the adoption of CVD graphene in wafer-scale fabrication. © 2017 IOP Publishing Ltd.
Iris type:
01.01 Articolo in rivista
Keywords:
CVD; Graphene; High-mobility; Seeded growth; Wafer scale integration
List of contributors:
Bianco, Federica
Authors of the University:
BIANCO FEDERICA
Handle:
https://iris.cnr.it/handle/20.500.14243/325952
Published in:
2D MATERIALS
Journal
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URL

https://iopscience.iop.org/article/10.1088/2053-1583/aa5481
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