3C-SiC film growth on Si substrates

The aim of this work is to give an overview on 3C-SiC growth on Si substrates. Starting from the reasons why SiC is considered such an interesting innovative material, with a survey of application already demonstrated, we will present data explaining the most important issues in this hetero-epitaxy system and how the chemical vapor deposition process influences the resulting 3C-SiC film properties. 3C-SiC crystal structure is strongly dependent on the process parameters within the reaction chamber during growth as well as the substrate surface properties. Part of this work is then focused on the main crystallographic defects characterizing the 3C-SiC/Si system and on the resulting wafer bow due to the large misfit between the materials. Defects and wafer bow, are a direct consequence of the large stress generated at the interface. The work closes discussing the encouraging improvements in 3C-SiC crystal quality obtained by the introduction of compliant Si substrates.