Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers

The authors demonstrate direct electron-beam writing on conjugated polymers as patterning route to realize plastic optoelectronic devices. Lithography was carried out by a 20 kV electron beam dose in the range of 0-360 mu C/cm(2), with no need for masking or development/etching processes. The features could be employed for the fabrication of polymer distributed feedback lasers, exhibiting optically pumped lasing in the range of 607-620 nm, with a spectral linewidth around 1 nm and a threshold excitation fluence of 34 mu J/cm(2).