In-situ soft X-ray effects on graphene oxide films

In the present study, the effects of soft X-ray irradiation on graphene oxide (GO) films are discussed. In particular, by means of the XPS technique, it has been observed that even with a short exposure time GO is sensitive to the soft x-ray radiation. The X-ray radiation effects were investigated evaluating the C/O atomic ratio. Different irradiation times were applied ranging between 12 and 450 min. Significant modifications were detected in the C/O ratio and consequently in the C1s and O1s XPS profiles. At the highest soft X-ray exposure times, we disclosed the transformation of the C-OH groups to the phenol/aromatic diol ones.