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Formation and incorporation of SiF4 molecules in F-implanted preamorphized Si

Articolo
Data di Pubblicazione:
2009
Abstract:
The local structure of fluorine incorporated in crystalline silicon following solid phase epitaxial regrowth was investigated by means of x-ray absorption spectroscopy at the F K-edge. We clearly demonstrate that most F is found in SiF4 molecules in the crystalline matrix. A kinetic pathway, which explains our observation and which is also able to rationalize previous results in a common and coherent framework, is proposed.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
XAFS; ion implantation; shallow junctions
Elenco autori:
Boscherini, Federico; Carnera, Alberto; DE SALVADOR, Davide; Priolo, Francesco; Napolitani, Enrico; Mirabella, Salvatore
Autori di Ateneo:
BOSCHERINI FEDERICO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/1044
Pubblicato in:
APPLIED PHYSICS LETTERS
Journal
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