Publication Date:
1999
abstract:
Vanadium pentoxide thin films are grown on glass and borosilicate substrates by PACVD using a vanadyl (IV) beta-
diketonate as precursor. The depositions are carried out in an RF-plasma reactor with Ar-O2 mixtures and soft process conditions,
obtaining high-purity nanocrystalline layers with a strong preferential orientation. The microstructural and morphological
characteristics of the films, analyzed respectively by XRD and AFM, show that the sample features can be accurately tailored by an
adequate choice of the synthesis conditions. The composition and purity of the films are studied by XPS and SIMS analyses.
Impedance Spectroscopy is used to study the conductivity of the layers and the dependence of electrical properties on microstructure.
diketonate as precursor. The depositions are carried out in an RF-plasma reactor with Ar-O2 mixtures and soft process conditions,
obtaining high-purity nanocrystalline layers with a strong preferential orientation. The microstructural and morphological
characteristics of the films, analyzed respectively by XRD and AFM, show that the sample features can be accurately tailored by an
adequate choice of the synthesis conditions. The composition and purity of the films are studied by XPS and SIMS analyses.
Impedance Spectroscopy is used to study the conductivity of the layers and the dependence of electrical properties on microstructure.
Iris type:
01.01 Articolo in rivista
List of contributors:
Gerbasi, Rosalba; Barreca, Davide
Published in: